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AIRF is organizing a workshop on Field Emssion Scanning Electron Microscopy Based Lithography on May 4 & 5

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Event Title
AIRF is organizing a workshop on Field Emssion Scanning Electron Microscopy Based Lithography on May 4 & 5
Event Details

Advanced Instrumentation Research Facility
JAWAHARLAL NEHRU UNIVERSITY

Tel: 91-11- 26704600, 26704560; Fax: 011-26741966
E mail: directorairf@mail.jnu.ac.in

Workshop on

Field Emssion Scanning Electron Microscopy Based Lithography

to be held on 4th – 5th May, 2017

organized jointly by AIRF & TESCAN Orsay Holding, A. S.

In order to provide the highest level of services to scientific community a series of workshop / training program on different sophisticated instruments in biological / chemical/ physical sciences are organized by AIRF throughout the year.

In this series, the next workshop will be on "Field Emssion Scanning Electron Microscopy, Based Lithography" to be held on 4th – 5th May, 2017. The workshop shall have lectures and practical sessions by application specialists. Emaphasis will be given on FIB and e-beam lithography.

Applications are invited from registered research students / scholars from an Academic Institution. Class size shall be limited to 20 participants. The workshop is open to all research students and scholars. Depending upon availability not more than one research student / scholar from each lab will be allowed. Decision of the screening committee shall be final and only selected candidates will be allowed to participate the workshop. Application forms are available at AIRF reception.

PRE – REGISTRATION 
The training is free and open to all registered research Students and Scholars. Application has to be sent to Director's Office on or before 25th April, 2017. The selected/shortlisted candidate's will be informed by email. No TA / DA will be paid.